φetch is a tool for feature scale plasma etching simulation. It links the fluxes of neutral and charged species* just above the wafer with the profile evolution of the etched features. The user can define the surface chemistry, the interaction of each species with each material of the etched structure. The etched features can be long trenches or axisymmetric holes.

*A code implementing a global model for the calculation of densities of neutral and charged species in the bulk plasma can be found at www.plasma-r.com.