76.

75.

G. Memos, E. Lidorikis, E. Gogolides, G. Kokkoris, A hybrid modeling framework for the investigation of surface roughening of polymers during oxygen plasma etching, J.Phys. D: Appl. Phys. 54, 175205 (2021).

74.

S. Mouchtouris and G. Kokkoris, A novel plasma fluid model for fast 2D calculations in capacitively coupled atmospheric pressure plasma jets, Plasma Sources Sci. Technol. 30 01LT01 (2021).

73.

K. Tsougeni, G. Kaprou, C.M. Loukas, G. Papadakis, A. Hamiot, M. Eck, D. Rabus, G. Kokkoris, S. Chatzandroulis, V. Papadopoulos, B. Dupuy, G. Jobst, E. Gizeli, A. Tserepi, E. Gogolides, Lab-on-Chip platform and protocol for rapid foodborne pathogen detection comprising on-chip cell capture, lysis, DNA amplification and surface-acoustic-wave detection, Sensors and Actuators B: Chemical 320, 128345 (2020).

72.

D. Passaras, E. Amanatides, G. Kokkoris, Predicting the flow of cold plasma jets in kINPen: A critical evaluation of turbulent models, J. Phys. D: Appl. Phys. 53, 265202 (2020).

71.

G. D. Kaprou, V. Papadopoulos, C. M. Loukas, G. Kokkoris, A. Tserepi, Towards PCB-Based Miniaturized Thermocyclers for DNA Amplification, Micromachines 11, 258 (2020).

70.

N. Cheimarios, G. Kokkoris, A. G. Boudouvis, Multiscale Modeling in Chemical Vapor Deposition Processes: Models and Methodologies , Arch. Computat. Methods Eng. (2020), https://doi.org/10.1007/s11831-019-09398-w

69.

G. Kaprou, V. Papadopoulos, D. Papageorgiou, G. Papadakis, S. Chatzandroulis, G. Kokkoris, and A. Tserepi, Ultrafast, PCB manufacturable, continuous-flow microdevice for DNA amplification” , Anal Bioanal Chem (2019).

68.

V. Krokos, G. Pashos, A. Spyropoulos, G. Kokkoris, A. G. Papathanasiou, A. G. Boudouvis Optimization of patterned surfaces for improved superhydrophobicity through cost-effective large-scale computations, Langmuir 35, 6793 (2019).

67.

N. Cheimarios, M. Kavousanakis, G. Kokkoris and A. G. Boudouvis, Beware of symmetry breaking and periodic flow regimes in axisymmetric CVD reactor setups , Computers & Chemical Engineering 124, 124 (2019).

65.

G. P. Chrysinas, G. Pashos, N. Vourdas, G. Kokkoris, V.N. Stathopoulos, and A.G. Boudouvis, Computational investigation of actuation mechanisms of droplets on porous air-permeable substrates , Soft Matter 14, 6090 (2018).

64.

G. Memos, E. Lidorikis, and G. Kokkoris, The interplay between surface charging and microscale roughness during plasma etching of polymeric substrates, J. Appl. Phys. 123, 073303 (2018).

61.

A. S. Kastania, K. Tsougeni, G. Papadakis, E. Gizeli, G. Kokkoris, A. Tserepi, E. Gogolides, Plasma micro-nanotextured polymeric micromixer for DNA purification with high efficiency and dynamic range, Analytica Chimica Acta 942, 58 (2016).

60.

N. Vourdas, G. Pashos, G. Kokkoris, A. G. Boudouvis, V. N. Stathopoulos, Droplet mobility manipulation on porous media using backpressure , Langmuir 32, 5250 (2016).

59.

57.

G. Pashos, G. Kokkoris, and A. G. Boudouvis, Wetting transitions on patterned surfaces with diffuse interaction potentials embedded in a Young-Laplace formulation , J. Chem. Phys. 144, 034105 (2016).

56.

A. Tserepi, E. Gogolides, A. Bourkoula, A. Kanioura, G. Kokkoris, P. S. Petrou, S. Kakabakos, Plasma Nanotextured Polymeric Surfaces for Controlling Cell Attachment and Proliferation: A Short Review, Plasma Chem. Plasma P. 36, 107 (2016).

55.

N. Cheimarios, G. Kokkoris, and A. G. Boudouvis, A multi-parallel multiscale computational framework for chemical vapor deposition processes , J. Comp. Sci. 15, 81 (2016).

54.

V. E. Papadopoulos, G. Kokkoris, I. N. Kefala, and A. Tserepi, Comparison of continuous-flow and static-chamber μPCR devices through a computational study: the potential of flexible polymeric substrates , Microfluid. Nanofluid. 19, 867 (2015).

53.

I. N. Kefala, V. E. Papadopoulos, G. Karpou, G. Kokkoris, G. Papadakis, and A. Tserepi, A labyrinth split and merge micromixer for bioanalytical applications, Microfluid. Nanofluid. 19, 1047 (2015).

52.

G. Pashos, G. Kokkoris, and A. G. Boudouvis, Minimum Energy Paths of Wetting Transitions on Grooved Surfaces , Langmuir, 31, 3059 (2015).

51.

G. Pashos, G. Kokkoris, and A. G. Boudouvis, A modified phase-field method for the investigation of wetting transitions of droplets on patterned surfaces , J. Comp. Phys. 283, 258 (2015).

50.

G. Kaprou, G. Papadakis, G. Kokkoris, V. Papadopoulos, I. Kefala, D. Papageorgiou, E. Gizeli, A. Tserepi, Miniaturized devices towards an integrated lab-on-a-chip platform for DNA diagnostics, Proc. SPIE 9518, Bio-MEMS and Medical Microdevices II, 95180G (2015).

49.

I. G. Aviziotis, T. Duguet, K. Soussi, G. Kokkoris, N. Cheimarios, C. Vahlas, A. G. Boudouvis, Investigation of the kinetics of the chemical vapor deposition of aluminum from dimethylethylamine alane: Experiments and computations”, Phys. Status Solidi C 12, 923 (2015).

48.

N. Kallikounis, G. Kokkoris, N. Cheimarios, A. G. Boudouvis, Designing non-uniform wafer micro-topography for macroscopic uniformity in multiscale chemical vapor deposition processes , Chem. Vapor Depos. 20, 364 (2014).

47.

D. Moschou, N. Vourdas, G. Kokkoris, G. Papadakis, J. Parthenios, S. Chatzandroulis, A. Tserepi, All-plastic, low-power, disposable, continuous-flow PCR chip with integrated microheaters for rapid DNA amplification , Sensors & Actuators: B. Chemical 199, 470 (2014).

46.

V. E. Papadopoulos, I. N. Kefala, G. Kaprou, G. Kokkoris, D. Moschou, G. Papadakis, E. Gizeli, A. Tserepi, A passive micromixer for enzymatic digestion of DNA , Microelectron. Eng. 124, 42 (2014).

45.

V. Constantoudis, G. Kokkoris, E. Gogolides, Resist roughness plays a key role in pattern transfer, 29 March 2013, SPIE NEWSROOM

44.

N. Škoro, N. Puač, S. Lazović, U. Cvelbar, G. Kokkoris, E. Gogolides, Characterization of Hydrogen-based RF plasmas suitable for surface cleaning processes: Validation of H atom actinometry in low-pressure H2 plasmas , J. Phys. D: Appl. Phys. 46, 475206 (2013).

43.

D. Moschou , N. Vourdas, M. K. Filippidou, V. Tsouti, G. Kokkoris, G. Tsekenis, I. Zergioti, S. Chatzandroulis, A. Tserepi, Integrated biochip for PCR-based DNA amplification and detection on capacitive biosensors, Proc. SPIE 8765, Bio-MEMS and Medical Microdevices, 87650L (2013).

42.

V. Constantoudis, G. Kokkoris, E. Gogolides, Three-dimensional geometrical modeling of plasma transfer effects on line edge roughness: comparison with experiments and rules of thumb, J. Micro/Nanolith. MEMS MOEMS 12, 041310 (2013).

41.

G. Kokkoris, P. Brault, A. L. Thomann, A. Caillard, D. Samelor, A. G. Boudouvis, C. Vahlas, Ballistic and molecular dynamics simulations of aluminum deposition in micro-trenches , Thin Solid Films 536, 115 (2013).

40.

E. Gogolides, V. Constantoudis, G. Kokkoris, Towards an integrated Line Edge Roughness Understanding: Metrology, Characterization and Plasma Etching Transfer, Proc. SPIE 8685, Advanced Etch Technology for Nanopatterning II, 868505 (2013).

39.

N. Cheimarios, G. Kokkoris, A. G. Boudouvis, An efficient parallel fixed point iteration method for multiscale analysis of chemical vapor deposition processes, App. Num. Math. 67, 78 (2013).

38.

M. Vlachopoulou, G. Kokkoris, C. Cardinaud, E. Gogolides, and A. Tserepi, Plasma etching of poly(dimethylsiloxane): roughness formation, mechanism, control, and application in the fabrication of microfluidic structures , Plasma Processes and Polymers 10, 29 (2013).

37.

N. Cheimarios, G. Kokkoris, A. G. Boudouvis, Multiscale Computational Analysis of the Interaction between the Wafer Micro-Topography and the Film Growth Regimes in Chemical Vapor Deposition Processes , ECS Journal of Solid State Science and Technology 1, P197 (2012).

36.

G. Kokkoris, V. Contstantoudis, and E. Gogolides, 3d modeling of LER transfer from the resist to the underlying substrate: the effect of the resist roughness, Proc. SPIE 8328, Advanced Etch Technology for Nanopatterning, 83280V (2012).

35.

34.

N. Cheimarios, S. Garnelis, A. G. Boudouvis, G. Kokkoris, A computational framework for multiscale analysis of chemical vapor deposition processes, European Community of Computational Methods in Applied Sciences (ECCOMAS) NEWSLETTER, November 2011, p. 5.

33.

Y. Ros, G. L. Vignoles, C. Germain, P. Supiot, G. Kokkoris, Simulation of Chemical Vapor Infiltration and Deposition Based on 3D Images: A Local Scale Approach , Chemical Vapor Deposition 17, 312 (2011).

31.

N. Cheimarios, S. Garnelis, G. Kokkoris, A. G. Boudouvis, Linking the operating parameters of chemical vapor deposition reactors with film conformality and surface nano-morphology, Journal of Nanoscience and Nanotechnology 11, 8132 (2011).

30.

E. Mavraki, D. Moschou, G. Kokkoris, N. Vourdas, S. Chatzandroulis, and A. Tserepi, A continuous flow μPCR device with integrated microheaters on a flexible polyimide substrate, Procedia Engineering 25, 1245 (2011).

29.

S. Garnelis, N. Cheimarios, G. Kokkoris, A. G. Boudouvis, Multiscale modeling of chemical vapor deposition of Silicon, Computer Aided Chemical Engineering 29, 131 (2011).

28.

E. Gogolides, A. Tserepi, V. Constantoudis, G. Kokkoris, D. Kontziampasis, K. Tsougeni, G. Boulousis, M. Vlachopoulou, Controlling roughness: From etching to nanotexturing and plasma directed organization on organic and inorganic materials , J. Phys. D.: Appl. Phys. 44, 174021 (2011).

27.

N. Cheimarios, G. Kokkoris, A. G. Boudouvis, Multiscale modeling in chemical vapor deposition processes: Coupling reactor scale with feature scale computations , Chem. Eng. Sci. 65, 5018 (2010).

26.

V. Constantoudis, G. Kokkoris, E. Gogolides, E. Pargon, M. Martin, Effect of resist sidewall morphology on line-edge roughenss reduction and transfer during etching: Is the resist sidewall after development isotropic or anisotropic?, Journal of Micro/Nanolithography, MEMS, and MOEMS 9, 041209 (2010).

25.

N. Vourdas, D. Kontziampasis, G. Kokkoris, V. Constantoudis, A. Goodyear, A. Tserepi, M. Cooke, E. Gogolides, Plasma directed assembly and organization: Bottom-up nanopatterning using a top-down technology, Nanotechnology 21, 085302 (2010).

24.

V. Constantoudis, G. Kokkoris, E. Gogolides, E. Pargon, M. Martin,[doi link] Is the resist sidewall after development isotropic or anisotropic? Effects of resist sidewall morphology on LER reduction and transfer during etching, The International Society for Optical Engineering, Advances in Resist Materials and Processing Technology XXVII 7639, 76392T (2010).

23.

V. Constantoudis, G. Kokkoris, P. Xydi, E. Gogolides, E. Pargon, M. Martin, Line Edge Roughness transfer during plasma etching: Modeling approaches and comparison with experimental results, Journal of Micro/Nanolithography, MEMS, and MOEMS 8, 043004 (2009).

22.

21.

V. Constantoudis, G. Kokkoris, P. Xydi, E. Gogolides, E. Pargon, M. Martin, Line Edge Roughness transfer during plasma etching: Modeling approaches and comparison with experimental results, Proceedings of SPIE, The International Society for Optical Engineering 7273, 72732J (2009).

20.

V. Constantoudis, G. Kokkoris, P. Xydi, G. P. Patsis, E. Gogolides, Modeling of line edge roughness transfer during plasma etching , Microelectron. Eng. 86, 968 (2009).

19.

M. Hauguth, B.E. Volland, V. Ishchuk, D. Dressler, T. Danz, I.W. Rangelow, G. Kokkoris, E. Gogolides, A. Goodyear, M. Cooke, Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator, Microelectron. Eng. 86, 976 (2009).

18.

G. Kokkoris, A. Panagiotopoulos, A. Goodyear, M. Cooke, E. Gogolides, A global model for SF6 plasmas coupling reaction kinetics in the gas phase and on the surface of the reactor walls , J. Phys. D: Appl. Phys. 42, 055209 (2009).

17.

G. Kokkoris, A. Goodyear, M. Cooke, E. Gogolides, A global model for C4F8 plasmas coupling gas phase and wall surface reaction kinetics, J. Phys. D: Appl. Phys. 41, 195211 (2008).

16.

G. Kokkoris, N. Vourdas, E. Gogolides, Plasma Etching and Roughening of Thin Polymeric Films: A Fast, Accurate, In Situ Method of Surface Roughness Measurement, Plasma Processes & Polymers 5, 825 (2008).

15.

G. Boulousis, V. Constantoudis, G. Kokkoris, E. Gogolides, Formation and metrology of dual scale nano-morphology on SF6 plasma etched silicon surfaces , Nanotechnology 19, 255301 (2008).

14.

D. Drygiannakis, G.P. Patsis, N. Tsikrikas, G. Kokkoris, A. Boudouvis, I. Raptis, E. Gogolides and P. Argitis, Stochastic simulation studies of molecular resists for the 32nm technology node , Microelectron. Eng. 85, 949 (2008).

13.

G. Kokkoris, A. Tserepi, E. Gogolides, The potential of neutral beams for deep Si nano-structure etching, J. Phys. D: Appl. Phys 41, 024004 (2008).

12.

G. Kokkoris, V. Constantoudis, P. Angelikopoulos, G. Boulousis, E. Gogolides, Dual nano-scale roughness on Si plasma etched surfaces: The role of etch inhibitors , Phys. Rev. B 76, 193405 (2007).

11.

N. Tsikrikas, D. Drygiannakis, G. P. Patsis, G. Kokkoris, I. Raptis, E. Gogolides, Stochastic simulation of material and process effects on the patterning of complex layouts, The International Society for Optical Engineering 6518 (part 2), 651836 (2007).

10.

D. Drygianakis, M. D. Nijkerk, G. P. Patsis, G. Kokkoris, I. Raptis, L. H. A. Leunissen, E. Gogolides, Simulation of the combined effects of polymer size, acid diffusion length and EUV secondary electron blur on resist line-edge roughness , The International Society for Optical Engineering 6519 (part 2), 65193T (2007).

9.

G. Kokkoris, A. G. Boudouvis, E. Gogolides, Integrated framework for the flux calculation of neutral species inside trenches and holes during plasma etching , J. Vac. Sci. Technol. A 24, 2008 (2006).

7.

E. Gogolides, C. Boukouras, G. Kokkoris, O. Brani, A. Tserepi, V. Constantoudis, Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation , Microelectron. Eng. 73-74, 312 (2004).

6.

A. Tserepi, C. Tsamis, G. Kokkoris, E. Gogolides, A. G. Nassiopoulou, Fabrication of suspended thermally insulating membranes using frontside micromachining of the Si substrate: characterization of the etching process , J. Micromech. Microeng. 13, 1 (2003).

4.

G. Kokkoris, E. Gogolides, A. G. Boudouvis, Simulation of fluorocarbon plasma etching of SiO2 structures, Microelectron. Eng. 57-58, 599 (2001).

3.

E. Gogolides, P. Vauvert, G. Kokkoris, G. Turban, A. G. Boudouvis, SiO2 and Si etching in fluorocarbon plasmas: A detailed surface model accounting for etching and deposition , J. Appl. Phys. 88, 5570 (2000).

2.

G. Kokkoris, E. Gogolides, A. G. Boudouvis, SiO2 and Si etching in fluorocarbon plasmas: Coupling of a surface model with a profile evolution simulator, Microelectron. Eng. 53, 395 (2000).

1.

E. Gogolides, P. Vauvert, Y. Courtin, G. Kokkoris, R. Pelle, A. G. Boudouvis, G. Turban, SiO2 and Si etching in fluorocarbon plasmas: A detailed surface model coupled with a complete plasma and profile simulator, Microelectron. Eng. 46, 311 (1999).